Method for making nano-scaled channels with nanowires as masks

ABSTRACT

A method of making nano-scaled channel, the method including: locating a first photoresist layer, a nanowire structure, and a second photoresist layer on a surface of a substrate, and the nanowire structure being sandwiched between the first photoresist layer and the second photoresist layer, wherein the nanowire structure comprises an nanowire; forming an opening in the first photoresist layer and the second photoresist layer to expose a portion of the surface of the substrate to form an exposed surface, wherein a part of the nanowire is exposed and suspended in the opening, and both ends of the nanowire are sandwiched between the first photoresist layer and the second photoresist layer; and depositing a thin film layer on the exposed surface of the substrate using the a nanowire as a mask, wherein the thin film layer defines a nano-scaled channel corresponding to the at least one nanowire.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims all benefits accruing under 35 U.S.C. § 119 fromChina Patent Application No. 201710239765.4, filed on Apr. 13, 2017, inthe China Intellectual Property Office, the disclosure of which isincorporated herein by reference.

FIELD

The subject matter herein generally relates to a method for makingnano-scaled channels.

BACKGROUND

At present in preparation of nanostructures, the minimum processing sizeis mainly determined by the performance of the processing devices. Andsome critical dimensions, especially sub-10 nanometers, has exceeded thelimits of the majority of processing devices. Even if the criticaldimensions can be obtained by processing devices, it is not easy tocontrol cost and yield.

Methods for making small dimension structures include evaporationstripping method and etching method. These methods require small-sizedpatterned photoresist layers as a mask to prepare small dimensionstructures such as fine groove structures. However, it is difficult toobtain the small-sized photoresist layers. If the photoresist layer istoo thick, it is difficult to stand up and easy to collapse. If thephotoresist layer is too thin, it is difficult to transfer thephotoresist layer. Also when the photoresist is removed by peeling oretching, the photoresist has a small amount of residue which cause thesmall dimension structures to be inaccurate.

What is needed, therefore, is to provide a method for making nano-scaledchannels for solving the problem discussed above.

BRIEF DESCRIPTION OF THE DRAWINGS

Many aspects of the embodiments can be better understood with referencesto the following drawings. The components in the drawings are notnecessarily drawn to scale, the emphasis instead being placed uponclearly illustrating the principles of the embodiments. Moreover, in thedrawings, like reference numerals designate corresponding partsthroughout the several views. Implementations of the present technologywill now be described, by way of example only, with reference to theattached figures, wherein:

FIG. 1 is a flow chart of one embodiment of a method for makingnano-scaled channels.

FIG. 2 is a flow chart of one embodiment of a first method for stackinga first photoresist layer, a carbon nanotube structure, and a secondphotoresist layer.

FIG. 3 is a flow chart of one embodiment of a second method for stackinga first photoresist layer, a carbon nanotube structure, and a secondphotoresist layer.

FIG. 4 is a flow chart of one embodiment of a third method for stackinga first photoresist layer, a carbon nanotube structure, and a secondphotoresist layer.

FIG. 5 is a flow chart of one embodiment of a fourth method for stackinga first photoresist layer, a carbon nanotube structure, and a secondphotoresist layer.

FIG. 6 shows Scanning Electron Microscope (SEM) images of carbonnanotube wires exposed by exposure.

FIG. 7 shows SEM images of nano-scaled channels.

FIG. 8 is a flow chart of one embodiment of a method for making a thinfilm transistor having nano-scaled channels.

FIG. 9 is a structural schematic view of an arrangement of a pluralityof thin film transistors.

FIG. 10 is a structural schematic view of an arrangement of a pluralityof thin film transistors.

FIG. 11 is a structural schematic view of an arrangement of a pluralityof thin film transistors.

FIG. 12 is a flow chart of one embodiment of a method for making a thinfilm transistor having nano-scaled channels.

FIG. 13 is a flow chart of one embodiment of a method for making a thinfilm transistor having nano-scaled channels.

DETAILED DESCRIPTION

It will be appreciated that for simplicity and clarity of illustration,where appropriate, reference numerals have been repeated among thedifferent figures to indicate corresponding or analogous elements. Inaddition, numerous specific details are set forth in order to provide athorough understanding of the embodiments described herein. However, itwill be understood by those of ordinary skill in the art that theembodiments described herein can be practiced without these specificdetails. In other instances, methods, procedures, and components havenot been described in detail so as not to obscure the related relevantfeature being described. The drawings are not necessarily to scale, andthe proportions of certain parts may be exaggerated to better illustratedetails and features. The description is not to be considered aslimiting the scope of the embodiments described herein.

Several definitions that apply throughout this disclosure will now bepresented.

The connection can be such that the objects are permanently connected orreleasably connected. The term “substantially” is defined to beessentially conforming to the particular dimension, shape or other wordthat substantially modifies, such that the component need not be exact.The term “comprising” means “including, but not necessarily limited to”;it specifically indicates open-ended inclusion or membership in aso-described combination, group, series and the like. It should be notedthat references to “an” or “one” embodiment in this disclosure are notnecessarily to the same embodiment, and such references mean at leastone.

Referring to FIG. 1, an embodiment of a method of making nano-scaledchannels 18 comprises:

S11, providing a substrate 11, locating a first photoresist layer 12, acarbon nanotube structure 13, and a second photoresist layer 14 on asurface of the substrate 11, and the carbon nanotube structure 13 beingsandwiched between the first photoresist layer 12 and the secondphotoresist layer 14, wherein the carbon nanotube structure 13 comprisesat least one carbon nanotube wire;S12, forming at least one opening in the first photoresist layer 12 andthe second photoresist layer 14 to expose a portion of the surface ofthe substrate 11 to form an exposed surface, wherein a part of thecarbon nanotube wire is exposed and suspended in the opening, and bothends of the carbon nanotube wire are sandwiched between the firstphotoresist layer 12 and the second photoresist layer 14; andS13, depositing a thin film layer 15 on the exposed surface of thesubstrate 11 using the carbon nanotube structure 13 as a mask, whereinthe thin film layer 15 defines nano-scaled channels 18 corresponding tothe carbon nanotube wire.

In step S11, the material of the substrate 11 can be insulatingmaterials such as silica or silicon nitride. The material of thesubstrate 11 can also be conductive materials such as gold, aluminum,nickel, chromium, or copper. Also the material of the substrate 11 canbe semiconductor materials such as silicon, gallium nitride, or galliumarsenide. In one exemplary embodiment, the material of the substrate 11is a silicon wafer.

The type of the first photoresist layer 12 and the second photoresistlayer 14 can be negative or positive. The type of the first photoresistlayer 12 and the second photoresist layer 14 are the same. The firstphotoresist layer 12 and the second photoresist layer 14 can be electronbeam photoresist layer or ultraviolet photoresist layer. In oneexemplary embodiment, the first photoresist layer 12 and the secondphotoresist layer 14 are electron beam photoresist layers. The materialsof the first photoresist layer 12 and the second photoresist layer 14can be poly methyl methacrylate (PMMA), ZEP. The thickness of the firstphotoresist layer 12 can be in a range from 50 nm to 400 nm. Thethickness of the second photoresist layer 14 can be in a range from 50nm to 300 nm. The thickness of the first photoresist layer 12 can be ina range from 100 nm to 350 nm. The thickness of the second photoresistlayer 14 can be in a range from 100 nm to 250 nm. In one exemplaryembodiment, the material of the first photoresist layer 12 is ZEP 520A,the thickness of the first photoresist layer 12 is 320 nm; the materialof the second photoresist layer 14 is PMMA 950A4, the thickness of thesecond photoresist layer 14 is 220 nm.

The carbon nanotube structure 13 includes at least a carbon nanotubewire. The carbon nanotube structure 13 can include a single carbonnanotube wire or a plurality of carbon nanotube wires. When the carbonnanotube structure 13 includes a plurality of carbon nanotube wires, theplurality of carbon nanotube wires can extend along a same direction,the plurality of carbon nanotube wires can be crossed to form a networkstructure. When the plurality of carbon nanotube wires are parallel witheach other, a distance between two adjacent carbon nanotubes is greaterthan or equal to 50 nanometers. In one exemplary embodiment, thedistance between two adjacent carbon nanotubes is greater than or equalto 100 nanometers. The carbon nanotube wires are formed by longsingle-walled carbon nanotubes. The diameter of the single-walled carbonnanotubes can be from about 0.5 nanometers to about 2 nanometers. Thelength of the single-walled carbon nanotubes can be greater than orequal to 1 micrometer. The length of the single-walled carbon nanotubescan be greater than 20 micrometers. The single-walled carbon nanotubescan be made by chemical vapor deposition. In one exemplary embodiment,the carbon nanotube structure 13 comprises a plurality of carbonnanotubes wires parallel with each other, and the distance between twoadjacent carbon nanotubes wire is 1 micrometer. Each carbon nanotubewire includes a single-walled carbon nanotube, and the diameter of thesingle-walled carbon nanotube is 1 nanometer, the length of thesingle-walled carbon nanotube is 50 micrometers.

The carbon nanotube structure 13 can be replaced by other nanowirestructures as long as the diameter of the nanowire is in nano-scaled.The nanowire structures can be metal nanowires such as nickel nanowires,platinum nanowires, gold nanowires. The nanowire structures can besemiconductor nanowires such as indium phosphide nanowires, siliconnanowires, gallium nitride nanowires. The nanowire structures can beinsulator nanowires such as silicon dioxide nanowires, titanium dioxidenanowires. The methods for making the nanowire structures can beconventional methods.

The method of locating a first photoresist layer 12, a carbon nanotubestructure 13, a second photoresist layer 14 on a surface of thesubstrate 11 can be achieved through the following methods. Firstmethod, the first photoresist layer 12, the carbon nanotube structure13, the second photoresist layer 14 are deposited on the surface of thesubstrate 11 in sequence. Second method, the first photoresist layer 12is deposited on the surface of the substrate 11 firstly; then the carbonnanotube structure 13 and the second photoresist layer 14 are providedon the surface of the first photoresist layer 12 together. Third method,the first photoresist layer 12 and the carbon nanotube structure 13 areapplied on the surface of the substrate 11 together; then the secondphotoresist layer 14 is provided on the carbon nanotube structure 13.Fourth method, the first photoresist layer 12 and a carbon nanotubestructure unit 131 are located on the surface of the substrate 11together; then another carbon nanotube structure unit 132 and the secondphotoresist layer 14 are provided on the carbon nanotube structure unit131, and the carbon nanotube structure unit 131 and the carbon nanotubestructure unit 132 are contacted and form the carbon nanotube structure13.

Referring to FIG. 2, the first method comprises following steps:firstly, coating the first photoresist layer 12 on the surface of thesubstrate 11 by spin coating method; secondly, growing the carbonnanotube structure 13 on a growth substrate 10; thirdly, transferringthe carbon nanotube structure 13 from the growth substrate 10 to thefirst photoresist layer 12; fourthly, coating the second photoresistlayer 14 on the first photoresist layer 12, wherein the secondphotoresist layer 14 covers the carbon nanotube structure 13 so that thecarbon nanotube structure 13 is sandwiched between the first photoresistlayer 12 and the second photoresist layer 14.

Referring to FIG. 3, the second method comprises following steps:firstly, coating the first photoresist layer 12 on the surface of thesubstrate 11; secondly, growing the carbon nanotube structure 13 on thegrowth substrate 10; thirdly, coating the second photoresist layer 14 onthe growth substrate 10, wherein the second photoresist layer 14 coversthe carbon nanotube structure 13; fourthly, separating the carbonnanotube structure 13 and the second photoresist layer 14 from thegrowth substrate 10, and the carbon nanotube structure 13 and the secondphotoresist layer 14 being provided on the surface of the firstphotoresist layer 12 together, wherein the carbon nanotube structure 13is sandwiched between the first photoresist layer 12 and the secondphotoresist layer 14. When the carbon nanotube structure 13 and thesecond photoresist layer 14 are separated from the growth substrate 10,the carbon nanotube structure 13 is bonded or adsorbed on the secondphotoresist layer 14.

Referring to FIG. 4, the third method comprises following steps:firstly, growing the carbon nanotube structure 13 on the growthsubstrate 10; secondly, coating the first photoresist layer 12 on thegrowth substrate 10 wherein the first photoresist layer 12 covers thecarbon nanotube structure 13; thirdly, separating the carbon nanotubestructure 13 and the first photoresist layer 12 from the growthsubstrate 10, and providing the carbon nanotube structure 13 and thefirst photoresist layer 12 together on the surface of the substrate 11,wherein the first photoresist layer 12 is sandwiched between thesubstrate 11 and the carbon nanotube structure 13; fourthly, coating thesecond photoresist layer 14 on the carbon nanotube structure 13.

Referring to FIG. 5, the fourth method comprises following steps:firstly, growing the first carbon nanotube structure unit 131 on a firstgrowth substrate 101, and spin coating the first photoresist layer 12 onthe first growth substrate 101 to cover the first carbon nanotubestructure unit 131; secondly, separating the first carbon nanotubestructure unit 131 and the first photoresist layer 12 from the firstgrowth substrate 101, and placing the first carbon nanotube structureunit 131 and the first photoresist layer 12 together on the surface ofthe substrate 11, wherein the first photoresist layer 12 is sandwichedbetween the substrate 11 and the first carbon nanotube structure unit131; thirdly, coating the second carbon nanotube structure unit 132 on asecond growth substrate 102, and spin coating the second photoresistlayer 14 on the second growth substrate 102 to cover the second carbonnanotube structure unit 132; fourthly, separating the second carbonnanotube structure unit 132 and the second photoresist layer 14 from thesecond growth substrate 102, and placing the second carbon nanotubestructure unit 132 and the second photoresist layer 14 together on thefirst carbon nanotube structure unit 131, wherein the first carbonnanotube structure unit 131 and the second carbon nanotube structureunit 132 are contacted and form the carbon nanotube structure 13.

Each of the carbon nanotube structure units 131 and 132 can comprise aplurality of parallel carbon nanotube wires. An extension direction ofcarbon nanotube wires in the carbon nanotube structure units 132 can beintersected with an extension direction of carbon nanotube wires in thecarbon nanotube structure units 131 so that the carbon nanotubestructure 13 form a network structure.

In step S12, the method for forming the opening can comprise followingsteps: firstly, selecting a pattern on the surface of the secondphotoresist layer 14; secondly, exposing the first photoresist layer 12and the second photoresist layer 14 corresponding to the pattern withelectron beam; thirdly, developing and removing the exposed photoresistto obtain the opening. After removal of the exposed photoresist, thesurface of the substrate 11 corresponding to the opening is exposed.According to the size of area of the second photoresist layer 14, oneopening or more openings spaced with each other can be formed in thefirst photoresist layer 12 and the second photoresist layer 14. Thesurface of the substrate 11 corresponding to each opening is exposed,and a part of the carbon nanotube structure 13 corresponding to eachopening is suspended. The shapes of openings can be designed byselecting the pattern. For example, the openings can be stripe openings,circular openings, polygonal openings. In one exemplary embodiment, aplurality of spaced and parallel strip openings are formed in thephotoresist layers, the width of each strip opening is 300 nanometers.

When the first photoresist layer 12 and the second photoresist layer 14is exposed, the intensity of exposure beam is selected according to thematerial and thickness of the photoresist layers. The process ofexposing the first photoresist layer 12 and the second photoresist layer14 comprises: vertically irradiating the pattern of the secondphotoresist layer 14 with a beam, wherein the beam can pass through thesecond photoresist layer 14 and irradiate the first photoresist layer12. The exposure area of the first photoresist layer 12 is same as theexposure area of the second photoresist layer 14. The beam can beelectron beam.

The method for developing and removing the photoresist includes: placingthe first photoresist layer 12 and the second photoresist layer 14 in adeveloper for a period of time. The developer is a mixed solution ofamyl acetate, and the developing time is 90 s. The developer is notlimited above as long as the exposed photoresist can be developed. Thedeveloping time can be determined by the concentration and component ofthe developer. The opening can be obtained by removing the exposedphotoresist. Since the carbon nanotube structure 13 is not affected bydevelopment, the carbon nanotube wires corresponding to the openings areexposed. Referring to FIG. 6, FIG. 6a is a SEM image of carbon nanotubewires exposed by exposure; FIG. 6b is a partial enlarged image of FIG.6a . Since both ends of the exposed carbon nanotube wires are stillsandwiched between the first photoresist layer 12 and the secondphotoresist layer 14, the exposed carbon nanotube wires are suspendedabove the substrate 11. The method further comprises fixing the exposedphotoresist with a fixing solution, and the fixing time is 30 s.

In step S13, the material of the thin film layer 15 can be metalmaterials such as gold, nickel, titanium, iron, aluminum. The materialof the thin film layer 15 can also be nonmetallic materials such asalumina, magnesium oxide, zinc oxide, hafnium oxide, and silica. Thematerial of the thin film layer 15 is not limited above as long as thematerial can form a film. The thin film layer 15 can be deposited bymagnetron sputtering, electron beam evaporation, or the like. Thethickness of the thin film layer 15 should be lower than the thicknessof the first photoresist layer 12, so that the carbon nanotube wires canalways be suspended above the thin film layer 15 and not contact withthe thin film layer 15, also the carbon nanotube wires are not wrappedby the thin film layer 15. If the thin film layer 15 is too thick, thetime of depositing the thin film layer 15 becomes longer, and thematerial deposited on the surface of the suspended carbon nanotube wireswould easily crushes the carbon nanotube wires.

During the process of depositing the thin film layer 15, the suspendedcarbon nanotubes as a mask can be coated with the film material, so thatthe surface of the substrate 11 corresponding to the mask cannot becoated with the film material, and other parts of the surface of thesubstrate can be coated with the film material. The part of thesubstrate surface, without film material deposited thereon, is definedas first region, and the shape and size of the first region are same asor similar to the shape and size of the carbon nanotube wires. A channel18 is formed at the first region.

However, the direction of depositing the film material is not strictlyperpendicular to the substrate surface 110 during actual depositionprocess, and there is a small deviation between the deposition directionand the vertical direction, so the width of the channel cannot beexactly same as the diameter of the carbon nanotube wire. For example,when the deposited material is deposited by a point-like evaporationsource, there is a deviation between the deposition direction and thevertical direction, so the width of the channel is slightly greater thanthe diameter of the carbon nanotube wire. In addition, during removingthe exposed photoresist, a small amount of the exposed photoresist mayremain on the surface of the carbon nanotube wires, so the diameter ofthe mask can be slightly greater than the diameter of the carbonnanotube wires, and the width of the channel can be slightly greaterthan the diameter of the carbon nanotube wire. Although the width of thechannel can be greater than the diameter of the carbon nanotube wiresdue to the deviation, the width of the channel can still be innano-scaled. The channel becomes smaller as the diameter of the carbonnanotube wires becomes smaller. Since the carbon nanotube wire iscomposed of single-walled carbon nanotubes, the diameter of thesingle-walled carbon nanotubes is in nano-scaled, so that the width ofthe channel is also in nano-scaled. In one exemplary embodiment, thewidth of the channel 18 can be in a range from about 5 nanometers toabout 10 nanometers. Referring to FIG. 7, FIG. 7(c)-(d) are ScanningElectron Microscope (SEM) images of nano-scaled channels 18. As can beseen from the FIG. 7, the width of the channels is in nano-scaled. Inone exemplary embodiment, the width of the channel 18 is 7.5 nanometers.

After obtaining the channels 18, the method further includes a step ofremoving the first photoresist layer 12, the second photoresist layer14, and the carbon nanotube structure 13, so that the channels 18 can beused to make electric device such as a thin film transistor (TFT). Forexample, the structure obtained in step S13 can be placed in aphotoresist removal solution. The photoresist removal solution can beacetone solution or butanone solution. In one exemplary embodiment, thefirst photoresist layer 12 and the second photoresist layer 14 areremoved by the butanone solution. Since the carbon nanotube structure 13is sandwiched between the first photoresist layer 12 and the secondphotoresist layer 14, the carbon nanotube structure 13 can also beremoved together. Only the thin film layer 15 is located on the surfaceof the substrate 11, and the channels 18 are formed on the thin filmlayer 15.

The advantages of the method of making nano-scaled channels aredescribed below. Since the carbon nanotube wires are used as a mask, themorphology of the carbon nanotube wires can be transferred to the thinfilm layer 15, and nano-scaled channels are obtained. The width of thechannels can be controlled by selecting the diameter of the carbonnanotubes wires. The carbon nanotube wires are not in contact with thethin film layer 15, so that the carbon nanotube wires can be easilyremoved. After removing the carbon nanotube wires, the pattern of thethin film layer 15 would not be damaged. The substrate and depositedmaterial are not limited by using the method, and the method is simpleand easy to be performed.

Referring to FIG. 8, an embodiment of a method of making a thin filmtransistor 20 with nano-scaled channels 18 comprises:

S21, providing a gate electrode 22 on a substrate 21, forming a gateinsulating layer 23 on a surface of the gate electrode 22;

S22, placing a semiconductor layer 24 on the gate insulating layer 23;

S23, locating a first photoresist layer 12, a carbon nanotube structure13, a second photoresist layer 14 on a surface of the semiconductorlayer 24, and the carbon nanotube structure 13 being sandwiched betweenthe first photoresist layer 12 and the second photoresist layer 14,wherein the carbon nanotube structure 13 comprises at least one carbonnanotube wire;S24, forming at least one opening in the first photoresist layer 12 andthe second photoresist layer 14 to expose a portion of the surface ofthe semiconductor layer 24 to form an exposed surface, wherein a part ofthe carbon nanotube wire is exposed and suspended in the opening, andboth ends of the carbon nanotube wire are sandwiched between the firstphotoresist layer 12 and the second photoresist layer 14;S25, depositing a conductive film layer 16 on the exposed surface of thesemiconductor layer 24 using the carbon nanotube structure 13 as a mask,wherein the conductive film layer 16 defines a nano-scaled channel 18corresponding to the carbon nanotube wire, and the conductive film layer16 is divided into two regions by the nano-scaled channel 18, one regionis used as a source electrode 25, and the other region is used as adrain electrode 26;S26, removing the first photoresist layer 12, the carbon nanotubestructure 13, and the second photoresist layer 14.

In step S21, the material of the gate electrode 22 is a conductivematerial. The conductive material can be metal, indium tin oxide,arsenic trioxide, conductive silver glue, conductive polymers, orconductive carbon nanotubes. The metal materials can be aluminum,copper, tungsten, molybdenum, gold, titanium, palladium or anycombination of alloys.

The material of the gate insulating layer 23 can be hard materials suchas alumina, hafnium oxide, silicon nitride, or silicon oxide. Thematerial of the gate insulating layer 23 can also be flexible materialssuch as benzocyclobutene (BCB), polyester, or acrylic resin.

The gate insulating layer 23 can be deposited on the gate electrode 22by a magnetron sputtering method or a electron beam deposition method.In one exemplary embodiment, the gate insulating layer 23 is depositedby electron beam deposition, and the material of the gate insulatinglayer 23 is alumina.

In step S22, the material of the semiconductor layer 24 can be galliumarsenide, gallium phosphide, gallium nitride, silicon carbide, germaniumsilicide, silicon, germanium, carbon nanotubes, graphene, or molybdenumsulfide. The method of forming the semiconductor layer 24 can be tilingmethod, epitaxial growth method, or vapor deposition method. When thesemiconductor layer 24 is a carbon nanotube layer, a graphene layer or amolybdenum sulfide layer, the semiconductor layer 24 can be transferredto the gate insulating layer 23 by a photoresist layer. In one exemplaryembodiment, the first photoresist layer 12 is spin-coated on the carbonnanotube layer grown on a growing substrate, then the carbon nanotubelayer and the first photoresist layer 12 are transferred to the gateinsulating layer 23 together. The carbon nanotube layer is sandwichedbetween the gate insulating layer 23 and the first photoresist layer 12and used as the semiconductor layer 24. The thickness of thesemiconductor layer 24 can be prepared as desired. The thickness of thesemiconductor layer 24 is greater than 5 nanometers. In one exemplaryembodiment, the thickness of the semiconductor layer 24 is 10nanometers.

In steps S23 to S25, the method of making channels is similar to themethod of making channels of FIG. 1 except that a conductive film layer16 is directly deposited on the semiconductor layer 24. The conductivefilm layer 16 can be directly used as the source electrode 25 and thedrain electrode 26, and a thin film transistor 20 having a nano-scaledchannel 18 can be obtained by the method.

The step S26 is same as the method of removing the first photoresistlayer 12, the carbon nanotube structure 13, and the second photoresistlayer 14 above. The thin film transistor 20 can be easily used afterremoving the photoresist layers and the carbon nanotube structure.

Furthermore, a plurality of thin film transistors can be made accordingto the number and locations of the nano-scaled channels. Each thin filmtransistors corresponds to one nano-scaled channel and the plurality ofthin film transistors are arranged in a pattern array. Referring to FIG.9, the plurality of thin film transistors can share a common gateelectrode. Referring to FIG. 10, each thin film transistor can also havea single gate electrode. The plurality of thin film transistors canshare a common semiconductor layer. Each thin film transistor can alsohave a single semiconductor layer. Referring to FIG. 11, a plurality ofgate electrodes are arranged in a pattern array and located on the samesubstrate, and a common gate insulating layer is located on and coverall the gate electrodes. A plurality of semiconductor layers are locatedon the gate insulating layer, and the plurality of semiconductor layersare arranged in a pattern array, wherein each semiconductor layercorresponds to a single gate electrode. A plurality of nano-scaledchannels are made on surfaces of the plurality of semiconductor layers,and each semiconductor layer corresponds to a nano-scaled channel.

Referring to FIG. 12, an embodiment of a method of making a thin filmtransistor 30 with a nano-scaled channel 18 comprises:

S31, providing a semiconductor layer 32 on a substrate 31;

S32, locating a first photoresist layer 12, a carbon nanotube structure13, a second photoresist layer 14 on a surface of the semiconductorlayer 32, and the carbon nanotube structure 13 being sandwiched betweenthe first photoresist layer 12 and the second photoresist layer 14,wherein the carbon nanotube structure 13 comprises at least one carbonnanotube wire;S33, forming at least one opening in the first photoresist layer 12 andthe second photoresist layer 14 to expose a portion of the surface ofthe semiconductor layer 32 to form an exposed surface, wherein a part ofthe carbon nanotube wire is exposed and suspended in the opening, andboth ends of the carbon nanotube wire are sandwiched between the firstphotoresist layer 12 and the second photoresist layer 14;S34, depositing a conductive film layer 16 on the exposed surface of thesemiconductor layer 32 using the carbon nanotube structure 13 as a mask,wherein the conductive film layer 16 defines a nano-scaled channel 18corresponding to the carbon nanotube wire, and the conductive film layer16 is divided into two regions by the nano-scaled channel 18, one regionis used as a source electrode 33, and the other region is used as adrain electrode 34;S35, removing the first photoresist layer 12, the carbon nanotubestructure 13, and the second photoresist layer 14;S36, forming an insulating layer 35 on the semiconductor layer 32 tocover the source electrode 33 and the drain electrode 34, locating agate electrode 36 on the insulating layer 35.

The method of making thin film transistor 30 is similar to the method ofmaking thin film transistor 20 except that the thin film transistor 30is a top gate type thin film transistor. The semiconductor layer 32 isprovided between the substrate 31 and the source electrode 33, the drainelectrode 34. The gate electrode 36 is insulated from the sourceelectrode 33, the drain electrode 34, and the semiconductor layer 32through the insulating layer 35.

Referring to FIG. 13, an embodiment of a method of making a thin filmtransistor 40 with nano-scaled channels comprises:

S41, providing an insulating layer 42 on a semiconductor substrate 41,and forming a semiconductor layer 43 on the insulating layer 42;

S42, locating a first photoresist layer 12, a carbon nanotube structure13, a second photoresist layer 14 on a surface of the semiconductorlayer 43, and the carbon nanotube structure 13 being sandwiched betweenthe first photoresist layer 12 and the second photoresist layer 14,wherein the carbon nanotube structure 13 comprises at least one carbonnanotube wire;S43, forming at least one opening in the first photoresist layer 12 andthe second photoresist layer 14 to expose a portion of the surface ofthe semiconductor layer 43 to form an exposed surface, wherein a part ofthe carbon nanotube wire is exposed and suspended in the opening, andboth ends of the carbon nanotube wire are sandwiched between the firstphotoresist layer 12 and the second photoresist layer 14;S44, depositing a conductive film layer 16 on the exposed surface of thesemiconductor layer 43 using the carbon nanotube structure 13 as a mask,wherein the conductive film layer 16 defines a nano-scaled channel 18corresponding to the carbon nanotube wire, and the conductive film layer16 is divided into two regions by the nano-scaled channel 18, one regionis used as a source electrode 44, and the other region is used as adrain electrode 45;S45, removing the first photoresist layer 12, the carbon nanotubestructure 13, and the second photoresist layer 14;S46, forming a gate electrode 46 on the semiconductor substrate 41,wherein the gate electrode 46 is electrically connected to thesemiconductor substrate 41.

The method of making thin film transistor 40 is similar to the method ofmaking thin film transistor 20 except that the gate electrode 46 islocated directly on the semiconductor substrate 41 and electricallyconnected to the semiconductor substrate 41. The voltage between thesource electrode 44 and the drain electrode 45 can be regulated by theelectrical conduction of the semiconductor substrate 41. The nano-scaledchannel 18 and the gate electrode 46 are on the same side of thesemiconductor substrate 41, thus, it is not necessary to precisely alignthe position of the nano-scaled channel 18 and the position of the gateelectrode 46. So it is easy to lay the carbon nanotube wires and themethod is simple.

The material of the semiconductor substrate 41 can be silicon, galliumarsenide, gallium phosphide, gallium nitride, silicon carbide, orgermanium silicide. The semiconductor substrate 41 can act as a support,and the semiconductor substrate 41 can also be used for electricalconduction so that the gate electrode 46 can regulate the sourceelectrode 44 and the drain electrode 45.

The gate electrode 46 is directly located on the semiconductor substrate41 and electrically connected to the semiconductor substrate 41. Beforethe preparation of the gate electrode 46, if the insulating layer 42covers the entire surface of the semiconductor substrate 41, the methodcan further include removing a part of the insulating layer 42 to exposea part of the surface of the semiconductor substrate 41. Therefore, thegate electrode 46 can be located directly on the surface of thesemiconductor substrate 41, and the gate electrode 46 is spaced from thesource electrode 44 and the drain electrode 45.

Furthermore, a plurality of source electrodes and drain electrodes canbe provided on the surface of the semiconductor layer 43, and theplurality of source electrodes and drain electrodes can be controlled bythe gate electrode 46. The position of the gate electrode 46 isadjustable as long as the gate electrode 46 is insulated from the sourceelectrodes and the drain electrodes.

The embodiments shown and described above are only examples. Even thoughnumerous characteristics and advantages of the present technology havebeen set forth in the foregoing description, together with details ofthe structure and function of the present disclosure, the disclosure isillustrative only, and changes may be made in the detail, including inmatters of shape, size, and arrangement of the parts within theprinciples of the present disclosure up to, and including, the fullextent established by the broad general meaning of the terms used in theclaims.

Depending on the embodiment, certain of the steps of methods describedmay be removed, others may be added, and the sequence of steps may bealtered. The description and the claims drawn to a method may comprisesome indication in reference to certain steps. However, the indicationused is only to be viewed for identification purposes and not as asuggestion as to an order for the steps.

What is claimed is:
 1. A method of making nano-scaled channel, themethod comprising: locating a first photoresist layer, a nanowirestructure, and a second photoresist layer on a surface of a substrate,and the nanowire structure being sandwiched between the firstphotoresist layer and the second photoresist layer, wherein the nanowirestructure comprises a nanowire; forming an opening in the firstphotoresist layer and the second photoresist layer to expose a portionof the surface of the substrate to form an exposed surface, wherein apart of the nanowire is exposed and suspended in the opening, and bothends of the nanowire are sandwiched between the first photoresist layerand the second photoresist layer; and depositing a thin film layer onthe exposed surface of the substrate using the nanowire as a mask,wherein the thin film layer defines a nano-scaled channel correspondingto the nanowire.
 2. The method as claimed in claim 1, wherein locatingthe first photoresist layer, the nanowire structure, and the secondphotoresist layer on the surface of the substrate comprising: coatingthe first photoresist layer on the substrate; growing the nanowirestructure on a growth substrate; transferring the nanowire structurefrom the growth substrate to the first photoresist layer; and coatingthe second photoresist layer on the nanowire structure.
 3. The method asclaimed in claim 1, wherein locating the first photoresist layer, thenanowire structure, and the second photoresist layer on the surface ofthe substrate comprising: depositing the first photoresist layer on thesubstrate; growing the nanowire structure on a growth substrate; coatingthe second photoresist layer on the nanowire structure; transferring thenanowire structure and the second photoresist layer from the growthsubstrate to the first photoresist layer.
 4. The method as claimed inclaim 1, wherein locating the first photoresist layer, the nanowirestructure, and the second photoresist layer on the surface of thesubstrate comprising: growing the nanowire structure on a growthsubstrate; coating the first photoresist layer on the nanowirestructure; transferring the nanowire structure and the first photoresistlayer from the growth substrate to the substrate; and depositing thesecond photoresist layer on the nanowire structure.
 5. The method asclaimed in claim 1, wherein locating the first photoresist layer, thenanowire structure, and the second photoresist layer on the surface ofthe substrate comprising: growing a first nanowire structure unit on afirst growth substrate; coating the first photoresist layer on a firstnanowire structure unit to form a first preform; transferring the firstpreform from the first growth substrate to the substrate; growing asecond nanowire structure unit on a second growth substrate; coating thesecond photoresist layer on the second nanowire structure unit to form asecond preform; transferring the second preform from the second growthsubstrate to the first nanowire structure unit, wherein the firstnanowire structure unit and the second nanowire structure unit are indirect contact with each other and form the nanowire structure.
 6. Themethod as claimed in claim 1, wherein the nanowire structure comprises aplurality of nanowires parallel to each other.
 7. The method as claimedin claim 1, wherein the nanowire structure comprises a plurality ofnanowires intersected with each other to form a network structure. 8.The method as claimed in claim 1, wherein a first thickness of the firstphotoresist layer is in a range of 50 nanometers to 400 nanometers. 9.The method as claimed in claim 1, wherein a second thickness of the thinfilm layer is less than a first thickness of the first photoresistlayer.
 10. The method as claimed in claim 1, wherein forming the openingcomprises exposing and removing a portion of the first photoresist layerand the second photoresist layer to form a patterned photoresist layer.11. The method as claimed in claim 10, further comprises removing thepatterned photoresist layer and the nanowire structure.
 12. The methodas claimed in claim 11, wherein removing the patterned photoresist layerand the nanowire structure comprises placing the patterned photoresistlayer in a photoresist removal solution.
 13. A method of makingnano-scaled channels, the method comprising: locating a mask preform ona surface of a substrate, wherein the mask preform comprises a firstphotoresist layer, a second photoresist layer stacked on the firstphotoresist layer, and at least one nanowire sandwiched between thefirst photoresist layer and the second photoresist layer; forming atleast one opening in the first photoresist layer and the secondphotoresist layer so that a portion of the surface of the substrate isexposed to form an exposed surface and a part of the at least onenanowire is exposed and suspended in the opening to form a mask; anddepositing a thin film layer on the exposed surface using the mask,wherein the thin film layer defines at least one nano-scaled channelcorresponding to the at least one nanowire.